Future prospects for dry etching
نویسندگان
چکیده
منابع مشابه
Dry etching and sputtering.
Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and the surface to be etched. Also, the momentum transfer of an incoming ion can cause direct removal of the material to be etched, which is undesir...
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The aim of this work is to demonstrate the “dry” etching based micro-fabrication technologies in the manufacturing of Single Crystal Silicon (SCS) for Micro-Electro/(Optical)-Mechanical-Systems (ME(O)MS). The ME(O)MS technology is very fast growing industry branch based often on the same silicon technology as integrated circuits. The process of plasma-dry etching is quite simple straightforward...
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ژورنال
عنوان ژورنال: Pure and Applied Chemistry
سال: 1996
ISSN: 1365-3075,0033-4545
DOI: 10.1351/pac199668051011